Journal of Physical Studies 24(3), Article 3702 [5 pages] (2020)
DOI: https://doi.org/10.30970/jps.24.3702 MAGNETICALLY STIMULATED CHANGES IN THE ELECTROPHYSICAL PROPERTIES OF THE NEAR-SURFACE SILICON LAYERB. V. Pavlyk , D. P. Slobodzyan , R. M. Lys , M. O. Kushlyk , R. I. Didyk, J. A. Shykorjak
Ivan Franko National University of Lviv, Department for Sensor and Semiconductor Electronics,
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This papers presents the results of the influence of a weak magnetic field (MF) (0.354 T) on the electrophysical properties of surface structures based on p-Si. A 300-hours exposure of single-crystal silicon samples in a magnetic field stimulates the decay of hydrogen-containing and oxygen-containing surface complexes (С-H$_{X}$, Si-O-H, О-Н) and the formation of Si-H$_{3}$ centers. As a result, the surface resistance increases and the barrier properties of the Bi-Si(p) contact deteriorate
Key words: silicon, magnetic field, elastic mechanical deformation, current-voltage characteristic, capacitance-voltage characteristic, IR absorption spectra