Journal of Physical Studies 25(1), Article 1602 [9 pages] (2021)
DOI: https://doi.org/10.30970/jps.25.1602 ELECTRON SCATTERING ANISOTROPY IN SILICONG. P. Gaidar{1} , P. I. Baranskii{2}
{1}Institute for Nuclear Research of the NAS of Ukraine,
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In \mbox{\textit{n}-Si} single crystals, the scattering anisotropy of charge carriers has been studied depending on the compensation level of impurities. Theoretical calculations were carried out within the framework of the anisotropic scattering theory. The electrical conductivity, the Hall effect, and the tensoresistance of silicon crystals with various difference and summary concentrations of impurities were measured. It was established that an increase in the scattering anisotropy in \mbox{\textit{n}-Si} crystals is practically independent of the degree of their compensation, but is associated only with an increase in the total concentration of ionized impurities. The intra-valley anisotropy of the scattering of charge carriers on dislocations as scatterers was studied for a fixed location of the current with respect to the direction of their preferred orientation. Dislocations (having a distinguished orientation) were introduced into the \mbox{\textit{n}-Si} crystal by the plastic bending deformation at 1073 K. It has been revealed that in \mbox{\textit{n}-Si} crystals, the intra-valley anisotropy of the scattering on dislocations is much higher than the scattering anisotropy on the charged point defects.
Key words: silicon, Hall effect, tensoresistance, compensation degree, scattering anisotropy, dislocations